Substrate cleaning apparatus and substrate cleaning method...

Details Substrate cleaning apparatus and substrate cleaning method... Substrate cleaning apparatus and substrate cleaning method...

2007-09-11

2010-10-05

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Processes

Including distortion or deformation of work

C134S009000, C134S015000, C134S032000

Reexamination Certificate

active

07806986

ABSTRACT:
Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the roll brush, stiffness of the bristle, and density of the bristle becomes larger from an end portion of the roll brush to a central portion thereof.

REFERENCES:
patent: 2465396 (1949-03-01), Peterson et al.
patent: 6401813 (2002-06-01), Carmichael et al.
patent: 5-198544 (1993-08-01), None
patent: 06-190346 (1994-07-01), None
patent: 01981969 (1995-02-01), None
patent: 2000-060641 (2000-02-01), None
patent: 2006-184388 (2006-07-01), None
patent: 2006-239503 (2006-09-01), None
Korean Patent Office issued a Korean Office Action dated Dec. 12, 2008.

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