Substrate cleaning apparatus and substrate cleaning method

Details Substrate cleaning apparatus and substrate cleaning method Substrate cleaning apparatus and substrate cleaning method

2002-10-30

2008-09-09

Barr, Michael (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S028000, C134S029000, C134S033000, C134S037000, C134S094100, C134S095100, C134S095200, C134S095300, C134S098100, C134S099100, C134S102100, C134S102200, C134S102300, C134S902000

Reexamination Certificate

active

07422641

ABSTRACT:
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.

REFERENCES:
patent: 5964952 (1999-10-01), Kunze-Concewitz
patent: 6367490 (2002-04-01), Namba
patent: 6387822 (2002-05-01), Murphy et al.
patent: 6558478 (2003-05-01), Katakabe et al.
patent: 6858091 (2005-02-01), Boyd et al.
patent: 6951221 (2005-10-01), Okuda et al.
patent: 7017281 (2006-03-01), Izumi
patent: 2002/0020763 (2002-02-01), Hirae et al.
patent: 2002/0035762 (2002-03-01), Okuda et al.
patent: 2003/0079764 (2003-05-01), Hirose et al.
patent: 2001-334181 (2001-12-01), None

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