Substrate cleaning apparatus and substrate cleaning method

Details Substrate cleaning apparatus and substrate cleaning method Substrate cleaning apparatus and substrate cleaning method

2008-01-01

2008-01-01

El-Arini, Zeinab (Department: 1746)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S002000, C134S003000, C134S028000, C134S029000, C134S033000, C134S036000, C134S037000, C134S094100, C134S095300, C134S095100, C134S098100, C134S099100, C134S102100, C134S102200, C134S103200

Reexamination Certificate

active

11026246

ABSTRACT:
A soft spray nozzle discharging a cleaning mist is vertically directed and fixed to an arm. A rinse nozzle discharging rinsing deionized water for suppressing obstruction is vertically fixed to the arm at a prescribed distance from the soft spray nozzle. During cleaning, it follows that both nozzles discharge detergents while keeping relative layout relation. Therefore, the discharged cleaning mist and rinsing deionized water do not interfere with each other before reaching the substrate but the used detergents are entirely horizontally splashed and recovered in a cup. Thus, the cleaning mist is prevented from scattering and adhering to the periphery.

REFERENCES:
patent: 5964952 (1999-10-01), Kunze-Concewitz
patent: 6247479 (2001-06-01), Taniyama et al.
patent: 6367490 (2002-04-01), Namba
patent: 6858091 (2005-02-01), Boyd et al.
patent: 7017281 (2006-03-01), Izumi
patent: 2002/0035762 (2002-03-01), Okuda et al.
patent: 2003-0036087 (2003-05-01), None

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