Substrate cleaning apparatus and substrate cleaning method

Details Substrate cleaning apparatus and substrate cleaning method Substrate cleaning apparatus and substrate cleaning method

2006-01-31

2006-01-31

Spisich, Mark (Department: 1744)

Brushing, scrubbing, and general cleaning

Machines

Brushing

C015S004000, C015S088200, C015S102000, C134S902000

Reexamination Certificate

active

06990704

ABSTRACT:
In order to perform scrub cleaning of a substrate, two different scrub heads31and32are employed. The scrub head31is superior to the scrub head32in terms of a capability of removing contamination. The scrub head32has a low level of adhesion to the contamination as compared with the scrub head31. The scrub heads31and32are moved such that the scrub head32follows the scrub head31. Consequently, it is possible to clean the substrate without re-applying contamination, which has been once removed from a surface of the substrate, to the surface of the substrate again.

REFERENCES:
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patent: 5911257 (1999-06-01), Morikawa et al.
patent: 5947134 (1999-09-01), Kim et al.
patent: 6158075 (2000-12-01), Tanaka et al.
patent: 6286525 (2001-09-01), Nishimura et al.
patent: 6543079 (2003-04-01), Yeo

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