Substrate cleaning apparatus and method

Details Substrate cleaning apparatus and method Substrate cleaning apparatus and method

2005-04-27

2009-12-08

Olsen, Allan (Department: 1792)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S021000, C216S067000

Reexamination Certificate

active

07628864

ABSTRACT:
A substrate cleaning apparatus includes a chamber for accommodating a substrate; a mounting table, disposed in the chamber, for mounting thereon the substrate; an electrode disposed in the mounting table, the substrate being attracted and held on the mounting table as a voltage is applied to the electrode; an exhaust unit for exhausting the inside of the chamber; a separating unit for separating the mounting table and the substrate to form a space therebetween; and a gas supply unit for supplying a gas into the space. While the space is formed, voltages of different polarities are alternately applied to the electrode, the gas supply unit supplies a gas into the space and the exhaust unit exhausts the inside of the chamber. The substrate cleaning apparatus further includes a gas introduction unit for introducing a gas into the chamber while the chamber is depressurized and the space is formed.

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