Coating apparatus – Work holders – or handling devices
Reexamination Certificate
2007-04-12
2010-11-23
Tadesse, Yewebdar T (Department: 1713)
Coating apparatus
Work holders, or handling devices
C118S503000, C118S050000, C118S326000, C118S712000, C118S686000, C414S936000, C414S940000, C414S941000, C414S217000
Reexamination Certificate
active
07836845
ABSTRACT:
The present invention provides a substrate carrying and processing apparatus which is intended to reduce the size of the space for storing substrates in each substrate storing section as much as possible so as to downsize the apparatus and increase the number of substrates to be stored therein as well as to enhance the throughput. The substrate carrying and processing apparatus comprises a carrier block S1which is adapted to position carriers20each receiving wafers W therein, a processing block S2including processing units U1to U4, 31used for processing each wafer, a main arms A1adapted to transfer each wafer to each processing unit, a rack unit U5which is disposed between the carrier block and the processing block and able to store wafers to be processed, and a transfer arm D adapted to transfer each wafer to the rack unit. The rack unit has openings11, 12to which the main arm and the transfer arm can transfer each substrate along two directions crossing to each other, and includes a plurality of placing shelves with a space therebetween and adapted to support a wafer. The main arms and transfer arms are configured such that they can be advanced into and retracted from the substrate storing section and such that they can be overlapped to the corresponding placing shelf in the vertical direction, when viewed in the horizontal direction.
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Enokida Suguru
Tanoue Mitsuhiro
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tadesse Yewebdar T
Tokyo Electron Limited
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