Substrate bias generator

Electrical transmission or interconnection systems – Personnel safety or limit control features – Interlock

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307296R, 307297, 357 41, 357 23, H03K 3353, H03K 301, H01L 2978, H01L 2702

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active

043842186

ABSTRACT:
A substrate bias generator which includes: an MOS capacitor having an electrically insulating film located between two electrodes, one of which is disposed on one main face of a P.sup.- semiconductor substrate; and first, second and a third N.sup.+ semiconductor regions disposed in a spaced relationship on that main face. The first and second regions form a grounded source and a drain of an MOSFET having a gate connected to both the drain and the other electrode of the capacitor. The second and third regions form a source and a drain of another MOSFET having a gate connected to both the drain and the other main face of the substrate. A train of square pulses is supplied to the one electrode of the capacitor.

REFERENCES:
patent: 3794862 (1974-02-01), Jenne
patent: 4115794 (1978-09-01), De La Moneda
patent: 4142114 (1979-02-01), Green
patent: 4255677 (1981-03-01), Boonstra et al.
patent: 4255756 (1981-03-01), Shimotori et al.
Pashley et al., "A 70-ns 1K MOS RAM", IEEE Int. Solid-State Circuits Conf. (2/76), Dig. Tech. Papers, pp. 138-139, 238.

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