Plant husbandry – Mushroom culture
Reexamination Certificate
2006-05-16
2006-05-16
Gellner, Jeffrey L. (Department: 3643)
Plant husbandry
Mushroom culture
C071S005000, C554S008000
Reexamination Certificate
active
07043874
ABSTRACT:
The present invention describes a new substrate comprising olive oil waste as the nutrient for growing edible and medicinal shiitake mushrooms (Lentinus edodes) in aseptic plastic bags. The invention further provides the strain Ile-1, a new and distinct variety of the speciesLentinus edodes, that grows very efficiently in the olive oil waste-containing substrate.
REFERENCES:
patent: 1833089 (1931-11-01), Morimoto
patent: 3942969 (1976-03-01), Carroll, Jr. et al.
patent: 4127965 (1978-12-01), Mee
patent: 4637163 (1987-01-01), Pellinen et al.
patent: 4646466 (1987-03-01), Olah
patent: 4874419 (1989-10-01), Wu
patent: 5574093 (1996-11-01), States, Sr. et al.
patent: 1 035 091 (2000-09-01), None
patent: 2007071 (1989-06-01), None
patent: 209034 (1994-03-01), None
patent: 63273415 (1988-11-01), None
patent: WO 00/15583 (2000-03-01), None
Zervakis et al. 1996. Bioremediation of Olive Oil Mill Wastes Through the Production of Fungal biomass. Penn State University.
Vinciguerra et al. 1995. Correlated effects during the bioconversion of waste olive oil byLentinus edodes. Bioresource Technology 51: 221-226.
Pompei et al.. Jun. 1994. The use of olive milling waste for the culture of mushrooms on perlite. Acta horticulture 361, pp. 179-185. (title only).
Bilay Viktor T.
Wasser Solomon P.
Browdy and Neimark , P.L.L.C.
Carmel-Haifa University Economic Corp. Ltd.
Gellner Jeffrey L.
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