Chemistry: electrical current producing apparatus – product – and – With pressure equalizing means for liquid immersion operation
Reexamination Certificate
2008-07-08
2008-07-08
Ryan, Patrick Joseph (Department: 1795)
Chemistry: electrical current producing apparatus, product, and
With pressure equalizing means for liquid immersion operation
C429S006000, C429S047000, C029S623300
Reexamination Certificate
active
07396610
ABSTRACT:
The present invention relates to a membrane electrode assembly wherein each gas diffusion substrate comprises a porous electrically conductive gasket member is located on the first and second planar faces of a peripheral portion of the sheet material. The electrocatalyst layers are not present adjacent to the gasket members and the edge of the membrane is sandwiched between the gasket members. The invention further relates to integrated cell assemblies and fuel cell stacks comprising membrane electrode assemblies according to the invention.
REFERENCES:
patent: 5264299 (1993-11-01), Krasij et al.
patent: 5284718 (1994-02-01), Chow et al.
patent: 5464700 (1995-11-01), Steck et al.
patent: 6020083 (2000-02-01), Breault et al.
patent: 6066409 (2000-05-01), Ronne et al.
patent: 6159628 (2000-12-01), Rajpolt et al.
patent: 6165634 (2000-12-01), Krasij et al.
patent: 6667124 (2003-12-01), Suenaga et al.
patent: 0 838 872 (1998-04-01), None
patent: 0 450 849 (2000-01-01), None
patent: 0 791-974 (2000-01-01), None
patent: 1 063 716 (2000-12-01), None
patent: WO-00/10216 (2000-02-01), None
patent: WO-00/26975 (2000-05-01), None
patent: WO-00/35037 (2000-06-01), None
patent: WO-00/47816 (2000-08-01), None
patent: WO-00/55933 (2000-09-01), None
International Search Report dated Sep. 5, 2003, from International Application No. PCT/GB02/02121.
British Search Report dated Oct. 5, 2001, from British Application No. 011202.1.
Barnett Christopher James
Gascoyne John Malcolm
Hards Graham Alan
Ralph Thomas Robertson
Johnson Matthey Public Limited Company
Parsons Thomas H.
RatnerPrestia
Ryan Patrick Joseph
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