Sublimating process for cleaning and protecting lithography...

Details Sublimating process for cleaning and protecting lithography... Sublimating process for cleaning and protecting lithography...

2006-07-04

2006-07-04

Meeks, Timothy (Department: 1762)

Coating processes

Removable protective coating applied

C427S299000, C427S421100

Reexamination Certificate

active

07070832

ABSTRACT:
Spraying a surface of a reticle with carbon dioxide snow cleans the surface and removes particles. Further spraying the surface of the reticle with carbon dioxide snow at a temperature below a carbon dioxide sublimation temperature forms a solid carbon dioxide layer on the surface. The solid carbon dioxide layer prevents particles from contacting the surface of the reticle. The solid carbon dioxide layer may be removed, and the reticle may be used in a extreme ultraviolet lithography tool.

REFERENCES:
patent: 4806455 (1989-02-01), LaBianca
patent: 6387602 (2002-05-01), Hayden et al.
patent: 6444984 (2002-09-01), Lundgren et al.
patent: 6619903 (2003-09-01), Friedman et al.
patent: 6835503 (2004-12-01), Krauth
patent: 2004/0185682 (2004-09-01), Foulke et al.
Carbon Dioxide Snow Cleaning website; www.co2clean.com; Copyright © 1996, Applied Surface Technologies, 15 Hawthorne Drive, New Providence, NJ 07974; (908) 464-6675; fax (908) 464-7475; printed Aug. 6, 2003.

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