Sub-valent molybdenum, tungsten, and chromium amides as sources

Details Sub-valent molybdenum, tungsten, and chromium amides as sources Sub-valent molybdenum, tungsten, and chromium amides as sources

1990-10-29

1991-11-12

Beck, Shrive

Coating processes

Electrical product produced

Metal coating

427250, 4271262, 4271261, 4272481, 4272551, 4272552, 427255, 427249, 427314, C23C 1606, C23C 1632

Patent

active

050646869

ABSTRACT:
A thermal CVD process for forming a selected refractory metal-containing film onto a substrate comprising the steps of:

REFERENCES:
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patent: 4853347 (1989-08-01), Buckhman et al.
patent: 4874642 (1989-10-01), Garg et al.
patent: 4902645 (1990-02-01), Ohba
patent: 4923715 (1990-05-01), Matsuda et al.
Blocher, Jr., "Chemical Vapor Deposition" P335-338 in Deposition Technologies for Films and Coatings Edited by Bunshah et al., Noyes Publications, New Jersey, 1982.
Bradley et al., "Covalent Compounds of Quadrivalent Transition Metals Part V. Molybdenum (IV) Dialkylamides" Journal of the Chemical Society (A) 1971, pp. 2741-2744.
Chisholm et al., J. Am. Chem. Soc., 98 pages 4477-4485 (1976).
Chisholm et al., Inorg. Chem., 26, pp. 3182-3186 (1987).
Chisholm et al., Inorg. Synthesis, 21, pp. 51-56 (1982).
Chisholm et al., J. Am. Chem Soc., 98, pp. 4469-4476 (1976).

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