Sub-resolution assist features for photolithography with...

Details Sub-resolution assist features for photolithography with... Sub-resolution assist features for photolithography with...

2005-12-07

2009-08-04

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000, C716S030000, C716S030000

Reexamination Certificate

active

07569310

ABSTRACT:
Sub-resolution assist features with trim ends are described for use in photolithography. A photolithography mask with elongated features is synthesized. A sub-resolution assist feature is applied to an end-to-end gap between the elongated features. Trim is applied to the ends of the sub-resolution assist feature, the trim connecting the sub-resolution assist feature to an end of a main feature, the trim having a narrower width than the remaining portion of the sub-resolution assist feature and the synthesized photolithography mask is modified to include the sub-resolution assist feature and trim.

REFERENCES:
patent: 6383691 (2002-05-01), Seitz et al.
patent: 2003/0208742 (2003-11-01), LaCour
patent: 2005/0202321 (2005-09-01), Gordon et al.
patent: 2006/0046160 (2006-03-01), Wallace et al.

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