Sub-100A range line width pattern fabrication

Radiant energy – Irradiation of objects or material

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Details

427 431, 430298, B05D 306

Patent

active

043160930

ABSTRACT:
Sub-100A line width patterns are formed on a member by electron beam conversion and fixing of a resist that arrives at the reaction zone point by surface migration into a resist pattern of a precise thickness and width while the member rests on an electron backscattering control support.

REFERENCES:
patent: 3549999 (1970-12-01), Norton
patent: 3971860 (1976-07-01), Broers et al.

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