Styryl compounds, process for preparing the same and photoresist

Details Styryl compounds, process for preparing the same and photoresist Styryl compounds, process for preparing the same and photoresist

1988-12-27

1993-06-08

Brust, Joseph Paul

Organic compounds -- part of the class 532-570 series

Organic compounds

Nitriles

556416, 556417, 558402, C07C25534

Patent

active

052181367

ABSTRACT:
A styryl compound of the formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.11 are the same or different and a hydrogen atom, an optionally substituted alkyl, alkenyl or aralkyl group or R.sub.1 and R.sub.2 may form a ring together with the nitrogen atom to which they are bonded, which ring may include at least one hetero atom in addition to said nitrogen atom; R.sub.10 is an optionally substituted alkylene group; R.sub.3 is --OH, --OCOR.sub.5 or --OSi(R.sub.5).sub.3 in which R.sup.5 is an alkyl group; R.sub.12 and R.sub.13 are independently a hydrogen atom, an optionally substituted lower alkyl or alkoxy group, an amide group or a halogen atom; X, Y, W and Z are the same or different and an electron attracting group, and n is a number of 2-15, which is suitable as a light absorber in a photoresist composition.

REFERENCES:
patent: 2798090 (1957-07-01), Krell et al.
patent: 2850520 (1958-09-01), Merian et al.
patent: 3331687 (1967-07-01), Kosche
patent: 4420555 (1983-12-01), Krueger et al.
patent: 4439372 (1984-03-01), Hugl et al.
patent: 4914190 (1990-04-01), Liechti et al.
patent: 4927732 (1990-05-01), Merrem et al.
patent: 4958043 (1990-09-01), Weaver et al.
patent: 4992558 (1991-02-01), Liechti et al.
C.A. vol. 73, 4959z, I. C. I. (1970).
C.A. vol. 92, 92:145967e, Rodionova, et al, (1980).
C.A. vol. 94, 94:141202v, Nishikuri, et al. (1981).
C.A. vol. 96, 96:164148n, Sumitomo Chem., (1982).
C.A. vol. 110, 110:145099p, Murata (1989).
Chem. Abs. 107:68178x (1987), Hirao, et al.
Chem. Abs. 105:216698t (1986), Adachi, et al.

Affiliated with

Also associated with

Rating

Styryl compounds, process for preparing the same and photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Styryl compounds, process for preparing the same and photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Styryl compounds, process for preparing the same and photoresist will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1935297