Styrene derivative, styrene polymer, photosensitive resin...

Details Styrene derivative, styrene polymer, photosensitive resin... Styrene derivative, styrene polymer, photosensitive resin...

2005-02-25

2008-10-21

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S193000, C430S270100, C430S325000, C430S326000, C430S330000

Reexamination Certificate

active

07439005

ABSTRACT:
There is disclosed a photosensitive resin composition for interlayer insulating films, surface protection films or the like, which exhibits excellent resolution and can be developed with an aqueous alkaline solution. The photosensitive resin composition is prepared using a polymer at least having a constitutional repeating unit represented by general formula II:wherein R1represents hydrogen atom or methyl group; R2to R9independently represent hydrogen atom, halogen atom or alkyl group having 1 to 4 carbon atoms; X represents —CH═N—, —CONH—, —(CH2)n—CH═N— or —(CH2)n—CONH— and the N atom in X is bonded to a carbon atom in the benzene ring having AO— at an o-position; A represents hydrogen atom or a group being decomposed by an acid; and n represents a positive integer of 1 to 3.

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M. Ueda, et al. Journal of Photopolymer Science and Technology, vol. 16(2), pp. 237 to 242 (2003).
K. Ebara, et al. Journal of Photopolymer Science and Technology, vol. 16(2), pp. 287 to 292 (2003).

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