Style gas ring with a guard extension

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156345, 438748, H01L 2100

Patent

active

060280107

ABSTRACT:
A ring prevents particulate build-up in a chemical spraying chamber, and includes a top portion that has a rim, and rests on a base flange of the spraying chamber, and a bottom portion that has a vertical segment that extends below a bottom surface of the base flange.

REFERENCES:
patent: 4612432 (1986-09-01), Sharp-Geisler
patent: 5494523 (1996-02-01), Stegger et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Style gas ring with a guard extension does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Style gas ring with a guard extension, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Style gas ring with a guard extension will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-520285

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.