Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Patent
1998-02-06
2000-02-22
Powell, William
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
156345, 438748, H01L 2100
Patent
active
060280107
ABSTRACT:
A ring prevents particulate build-up in a chemical spraying chamber, and includes a top portion that has a rim, and rests on a base flange of the spraying chamber, and a bottom portion that has a vertical segment that extends below a bottom surface of the base flange.
REFERENCES:
patent: 4612432 (1986-09-01), Sharp-Geisler
patent: 5494523 (1996-02-01), Stegger et al.
Gonzales Augusto James
Ozee Jeffrey Eugene
Szettella Joseph Mitchell
Tucker Bryan Cary
Kananen Ronald P.
Powell William
Sony Corporation
Sony Electronics Inc.
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