Stud electrode and process for making same

Details Stud electrode and process for making same Stud electrode and process for making same

2007-09-18

2007-09-18

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Making passive device

Stacked capacitor

C257SE21008

Reexamination Certificate

active

11215922

ABSTRACT:
A process of making a stud capacitor structure is disclosed. The process includes embedding the stud in a dielectric stack. In one embodiment, the process includes forming an electrically conductive seed film in a contact corridor of the dielectric stack. A storage cell stud is also disclosed. The storage cell stud can be employed in a dynamic random-access memory device. An electrical system is also disclosed that includes the storage cell stud.

REFERENCES:
patent: 4025411 (1977-05-01), Hom-Ma et al.
patent: 4350729 (1982-09-01), Nakano et al.
patent: 4444618 (1984-04-01), Saia et al.
patent: 4863559 (1989-09-01), Douglas
patent: 5108542 (1992-04-01), Lin
patent: 5185058 (1993-02-01), Cathey, Jr.
patent: 5270259 (1993-12-01), Ito et al.
patent: 5294294 (1994-03-01), Namose
patent: 5372974 (1994-12-01), Doan et al.
patent: 5397432 (1995-03-01), Konno et al.
patent: 5405806 (1995-04-01), Pfiester et al.
patent: 5515984 (1996-05-01), Yokoyama et al.
patent: 5599743 (1997-02-01), Nakagawa et al.
patent: 5614438 (1997-03-01), Evans, Jr. et al.
patent: 5651856 (1997-07-01), Keller et al.
patent: 5670019 (1997-09-01), Huang
patent: 5691235 (1997-11-01), Meikle et al.
patent: 5834348 (1998-11-01), Kwon et al.
patent: 5840200 (1998-11-01), Nakagawa et al.
patent: 5843830 (1998-12-01), Graettinger et al.
patent: 5856707 (1999-01-01), Sardella
patent: 5930639 (1999-07-01), Schuele et al.
patent: 6048763 (2000-04-01), Doan et al.
patent: 6049101 (2000-04-01), Graettinger et al.
patent: 6083803 (2000-07-01), Fischer et al.
patent: 6146961 (2000-11-01), Graettinger et al.
patent: 6149828 (2000-11-01), Vaartstra
patent: 6159818 (2000-12-01), Durcan et al.
patent: 6190960 (2001-02-01), Noble
patent: 6239461 (2001-05-01), Lee
patent: 6249040 (2001-06-01), Lin et al.
patent: 6280793 (2001-08-01), Atwell et al.
patent: 6281091 (2001-08-01), Durcan et al.
patent: 6291289 (2001-09-01), Rhodes et al.
patent: 6319832 (2001-11-01), Uhlenbrock et al.
patent: 6325017 (2001-12-01), DeBoer et al.
patent: 6326218 (2001-12-01), Yunogami et al.
patent: 6329263 (2001-12-01), Durcan et al.
patent: 6333240 (2001-12-01), Durcan et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6348709 (2002-02-01), Graettinger et al.
patent: 6388282 (2002-05-01), Hieda
patent: 6388284 (2002-05-01), Rhodes et al.
patent: 6391735 (2002-05-01), Durcan et al.
patent: 6395600 (2002-05-01), Durcan et al.
patent: 6395601 (2002-05-01), Hong et al.
patent: 6429086 (2002-08-01), Meikle et al.
patent: 6445023 (2002-09-01), Vaartstra et al.
patent: 6461982 (2002-10-01), DeBoer et al.
patent: 6468874 (2002-10-01), Yu et al.
patent: 6472323 (2002-10-01), Meikle et al.
patent: 6495459 (2002-12-01), Uhlenbrock et al.
patent: 6528834 (2003-03-01), Durcan et al.
patent: 6573199 (2003-06-01), Sandhu et al.
patent: 6608342 (2003-08-01), Durcan et al.
patent: 6613702 (2003-09-01), Sandhu et al.
patent: 6620680 (2003-09-01), Durcan et al.
patent: 6656839 (2003-12-01), Uhlenbrock et al.
patent: 6661048 (2003-12-01), Yamanaka et al.
patent: 6661051 (2003-12-01), Durcan et al.
patent: 6664159 (2003-12-01), Vaartstra et al.
patent: 6666986 (2003-12-01), Vaartstra
patent: 6683005 (2004-01-01), Sandhu et al.
patent: 6690044 (2004-02-01), Doan et al.
patent: 6693319 (2004-02-01), Durcan et al.
patent: 6720272 (2004-04-01), Sandhu et al.
patent: 6730954 (2004-05-01), Meikle et al.
patent: 6753563 (2004-06-01), Havemann
patent: 6753565 (2004-06-01), Durcan et al.
patent: 6764956 (2004-07-01), Sandhu et al.
patent: 6773495 (2004-08-01), Uhlenbrock et al.
patent: 6784049 (2004-08-01), Vaartstra
patent: 6815754 (2004-11-01), Clampitt
patent: 6847077 (2005-01-01), Thomas et al.
patent: 6903398 (2005-06-01), Yamamoto
patent: 7002201 (2006-02-01), Yasuda
patent: 7056788 (2006-06-01), Nakamura
patent: 2001/0020448 (2001-09-01), Vaartstra et al.
patent: 2001/0023100 (2001-09-01), Hong et al.
patent: 2001/0024387 (2001-09-01), Raaijmakers et al.
patent: 2001/0025974 (2001-10-01), Gealy et al.
patent: 2001/0036752 (2001-11-01), Deboer et al.
patent: 2002/0045322 (2002-04-01), Meikle et al.
patent: 2002/0079581 (2002-06-01), Graettinger et al.
patent: 2002/0094634 (2002-07-01), Chung et al.
patent: 2002/0098654 (2002-07-01), Durcan et al.
patent: 2002/0125508 (2002-09-01), Durcan et al.
patent: 2002/0146850 (2002-10-01), Choi
patent: 2002/0187654 (2002-12-01), DeBoer et al.
patent: 2003/0203588 (2003-10-01), Song et al.
patent: 2004/0043633 (2004-03-01), Vaartstra
patent: 2004/0043636 (2004-03-01), Vaartstra et al.
patent: 2005/0032346 (2005-02-01), Graettinger

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