Structures useful in electron beam lithography

Details Structures useful in electron beam lithography Structures useful in electron beam lithography

2005-07-19

2005-07-19

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06919150

ABSTRACT:
A method for forming a mask assembly for use in lithography, typically electron-beam lithography, first forms in a substrate one half of a plurality of opening therethrough and then fills the openings with a removable fill material. Thereafter are formed the other half of the openings which are then filled with the removable fill material. After all the openings have been formed and filled, a support membrane is formed over the substrate and covers the filled windows. A mask layer is then formed over the membrane and patterned. The fill is then removed from all of the windows.

REFERENCES:
patent: 4827138 (1989-05-01), Randall
patent: 5899728 (1999-05-01), Mangat et al.
patent: 6168890 (2001-01-01), Takahashi
S. D. Berger et al., “New approach to projection-electron lithography with demonstrated 0.1μm linewidth”, Applied Physics Letters, vol. 57, No. 2, pp. 153-155 (Jul. 1990).
S. D. Berger et al., “Projection electron-beam lithography: A new approach”, J. Vac. Sci. Technol. B, vol. 9, No. 6, pp. 2996-2999 (Nov./Dec. 1991).

Affiliated with

Also associated with

Rating

Structures useful in electron beam lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structures useful in electron beam lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structures useful in electron beam lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3368585