Structures, electron-emitting devices, image-forming...

Electric lamp and discharge devices – Discharging devices with apertured electrode interposed... – Plural interposed apertured electrodes

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C313S310000, C313S309000, C313S351000, C313S336000, C313S34600R

Reexamination Certificate

active

06943488

ABSTRACT:
Provided are electron-emitting devices improved in durability during concentration of an electric field and thus rarely suffering chain discharge breakdown. An electron-emitting device has an electroconductive film, a layer placed on the electroconductive film and containing aluminum oxide as a main component, a pore placed in the layer containing aluminum oxide as a main component, and an electron emitter placed in the pore and containing a material of the electroconductive film, and the electron emitter is porous and is electrically connected to the electroconductive film.

REFERENCES:
patent: 6204596 (2001-03-01), Macaulay et al.
patent: 6278231 (2001-08-01), Iwasaki et al.
patent: 6476409 (2002-11-01), Iwasaki et al.
patent: 6498426 (2002-12-01), Watabe et al.
patent: 6525461 (2003-02-01), Iwasaki et al.
patent: 0 913 508 (1999-05-01), None
patent: 0 951 047 (1999-10-01), None
patent: 5-211030 (1993-08-01), None
patent: 10-12124 (1998-01-01), None
patent: 11-194134 (1999-07-01), None
patent: 11-200090 (1999-07-01), None
patent: 2000-031462 (2000-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Structures, electron-emitting devices, image-forming... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structures, electron-emitting devices, image-forming..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structures, electron-emitting devices, image-forming... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3449976

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.