Structures and methods for limiting current in ionizable gaseous

Computer graphics processing and selective visual display system – Plural physical display element control system – Display elements arranged in matrix

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

345 66, G09G 328

Patent

active

059560029

ABSTRACT:
This invention is a resistive layer (112, 122) for electrodes (30, 62) comprising at least one partially conductive compound and describes processes for coating the electrodes by way of cataphoretic deposition and/or screen printing of particles of at least one partially conductive compound. A second class of particles, known as a "frit," is also deposited or screen printed. In the subsequent one hour firing, these particles melt and thereby bond the partially conductive compound particles to the electrodes. This invention is also plasma addressing structures (110, 120) in which particles of at least one partially conductive compound are deposited on the electrodes of the display by cataphoretic deposition and/or screen printing. The resulting electrode structures limit and uniformly distribute discharge currents (102) in the operation of ionizable gaseous medium (90) devices, such as plasma addressed liquid crystal displays.

REFERENCES:
patent: 4896149 (1990-01-01), Buzak et al.
patent: 5349455 (1994-09-01), Hayashi et al.
patent: 5453660 (1995-09-01), Martin et al.
patent: 5519520 (1996-05-01), Stoller

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Structures and methods for limiting current in ionizable gaseous does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Structures and methods for limiting current in ionizable gaseous, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structures and methods for limiting current in ionizable gaseous will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-84534

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.