Coating apparatus – Gas or vapor deposition – Running length work
Patent
1999-05-07
2000-11-14
Beck, Shrive
Coating apparatus
Gas or vapor deposition
Running length work
118723HC, 118723FI, C23C 1600
Patent
active
061464627
ABSTRACT:
Methods and apparatus for plasma modifying a substrate are disclosed along with associated techniques for applying coatings to the substrate. Particular utility has been found using a hollow cathode to generate the plasma along with magnetic focusing means to focus the plasma at the surface of a substrate.
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Decker Wolfgang
Ellwanger Richard E.
Johnson C. Barry
Mikhael Michael G.
O'Brien Timothy D.
AstenJohnson, Inc.
Beck Shrive
Hassanzadeh Parviz
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