Structure of quantum dot light emitting diode and method of...

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

Reexamination Certificate

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C257S102000, C257S013000, C257S083000, C257S021000, C257S079000, C257S080000, C257S018000

Reexamination Certificate

active

06909108

ABSTRACT:
An InAs/GaAs quantum dot light emitting diode and a method of fabricating the same are disclosed. The InAs/GaAs quantum dot light emitting diode which is formed by turning off an As shutter and using As background concentration for epitaxy, comprises a Si-doped GaAs substrate, a N-type structure, an undoped quantum well, aseries of quantum dot layers, spacer layers, a barrier layer and a P-type structure.

REFERENCES:
patent: 5780867 (1998-07-01), Fritz et al.
patent: 2002/0162995 (2002-11-01), Petroff et al.
patent: 2002237456 (2002-08-01), None

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