Structure of a mask for use in a lithography process of a semico

Details Structure of a mask for use in a lithography process of a semico Structure of a mask for use in a lithography process of a semico

1997-04-15

1998-08-25

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057981922

ABSTRACT:
A structure of a mask for use in a lithography process in a semiconductor fabrication procedure is disclosed. The structure comprising: a mask base being made of transparent material; a plurality of patterns formed on said mask base, said patterns being used for generating an image on a wafer and being made of a conductive opaque material; and a conductive layer formed on said mask base and said plurality of patterns.

REFERENCES:
patent: 4587184 (1986-05-01), Schneider-gmelch et al.
patent: 5403683 (1995-04-01), Ohta et al.

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