Patent
1984-06-29
1986-03-18
James, Andrew J.
357 65, 357 67, 357 71, 357 34, H01L 2952, H01L 2954, H01L 2350
Patent
active
045772126
ABSTRACT:
An emitter contact structure is disclosed for alleviating forward bias beta degradation in a bipolar transistor. The structure comprises emitter contact metallurgy which travels over a dielectric insulating layer having an area of increased thickness adjacent to the area of contact between the metallurgy and the emitter.
REFERENCES:
patent: 3702427 (1972-11-01), Learn et al.
patent: 3716469 (1973-02-01), Bhatt et al.
patent: 3813263 (1974-05-01), Rosenberg
patent: 3848330 (1974-11-01), Hall et al.
patent: 4017890 (1977-04-01), Howard et al.
patent: 4121241 (1978-10-01), Drake et al.
IBM TDB, vol. 13, No. 7, Dec. 1970, pp. 2011 and 2014.
Thin Solid Films, 46, (1977), pp. 139-150.
Applied Physics Letters, vol. 29, No. 3, Aug. 1, 1970, pp. 131-133.
Applied Physics Letters, vol. 30, No. 8, Apr. 15, 1977, pp. 387-389.
Journal of Applied Physics, vol. 53, No. 6, 1982, pp. 4456-4462.
Hueckel Gary R.
Prokop George S.
Fallick E.
Haase Robert J.
International Business Machines - Corporation
James Andrew J.
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