Structure for filtering CVD chamber process gases

Details Structure for filtering CVD chamber process gases Structure for filtering CVD chamber process gases

1990-10-02

1992-06-23

Nozick, Bernard

Coating apparatus

Gas or vapor deposition

55267, 55350, 55482, C23C 1600

Patent

active

051233754

ABSTRACT:
A structure for filtering process gases prior to said process gases being allowed to enter a CVD chamber includes improved filter and control means to ensure high purity of the process gases. In one embodiment, a first filter means is located in a first section of a gas line being isolated by valves at both ends of the gas line section. A second filter means is located in a downstream gas line section for further filtering.

REFERENCES:
patent: 1455116 (1923-05-01), Lumley

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