Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system
Reexamination Certificate
2007-06-26
2007-06-26
Shah, Kamini (Department: 2128)
Data processing: structural design, modeling, simulation, and em
Simulating electronic device or electrical system
C716S030000, C716S030000, C430S005000, C359S290000
Reexamination Certificate
active
10658933
ABSTRACT:
A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask or for certain types of structures. Typically, the attenuated rim is made as large as possible to maximize the effect of the attenuated phase-shifting region while still preventing the printing of larger portions of the attenuated phase-shifting region during the development process.
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Kachwala et al□□High Transmission Attenuated PSM—Benefits and Limitations through a Validation Study of 33%, 205 and 6% Transmission Masks□□Optical Microlithography XIII, Feb. 27- Mar. 3, 2000, Santa Clara, California, USA.
Pierrat Christophe
Zhang Youping
Bever Hoffman & Harms LLP
Harms Jeanette S.
Luu Cuong
Shah Kamini
Synopsys Inc.
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