Structure and method for sub-resolution dummy clear shapes...

Details Structure and method for sub-resolution dummy clear shapes... Structure and method for sub-resolution dummy clear shapes...

2007-03-16

2010-12-28

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S030000

Reexamination Certificate

active

07858269

ABSTRACT:
A mask system for use by a lithographic system to project an image of a circuit design. The design includes at least one large feature and at least one nearby small feature. The mask comprises one or more shapes on a mask to project an image of the nearby small feature and, on the same mask or on a different mask, an opaque shape to project an image of the large feature. The opaque shape includes in a field thereof at least one dummy clear shape of size and configuration insufficient to be resolved. Light from the lithographic projection system may be projected through the opaque shape and the dummy clear shape to resolve an image of the large circuit feature on a resist layer of a wafer without resolving the clear shape on the resist layer, while simultaneously increasing optical flare on the resolved large circuit feature image.

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