Structure and method for providing a gas purge for a vacuum part

Details Structure and method for providing a gas purge for a vacuum part Structure and method for providing a gas purge for a vacuum part

1993-02-26

1994-11-01

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356338, G01N 1506

Patent

active

053609808

ABSTRACT:
A structure and an apparatus are provided for use in particle sensor installed to monitor particle level of a process chamber. The process chamber receives process gas from a supply line and removes gas through an exhaust line. The particle sensor's optical components are prevented from contamination by corrosive or coating species in the effluent from the process, by a gas purge line installed in the particle sensor. The gas purge line allows a flow of gas to purge the optical components at a flux not less than the flux of gas being removed from the process chamber in the exhaust line. The flux out of the particle sensor prevents the undesired species from reaching the optical components of the particle sensor from the sampling area where the particle sensor detects the particle level.

REFERENCES:
patent: 3986023 (1976-10-01), Frungel
patent: 4752131 (1988-06-01), Eisenlauer et al.
patent: 5083865 (1992-01-01), Kinney et al.
patent: 5153671 (1992-10-01), Miles

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