Structure and method for hyper-abrupt junction varactors

Semiconductor device manufacturing: process – Voltage variable capacitance device manufacture

Reexamination Certificate

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C438S238000, C438S514000, C438S526000

Reexamination Certificate

active

10707905

ABSTRACT:
A method and device providing a HA junction varactor which may be fabricated with a reduced variation in C-V tuning curve from one varactor to the next. The process produces a varactor with an active region formed substantially by doping an Si substrate with various dopants at various energy levels. Accordingly, unit-to-unit device variation is reduced because etching, growing, and deposition processes to make the active portion of the varactor are reduced or eliminated. The resulting HA junction has a more uniform thickness, and a more uniform doping profile.

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