Structure and method for collar self-aligned to buried plate

Semiconductor device manufacturing: process – Making passive device – Trench capacitor

Reexamination Certificate

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C438S389000, C438S391000, C438S393000, C438S394000, C438S395000

Reexamination Certificate

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10710061

ABSTRACT:
A structure and method are provided for forming a collar surrounding a portion of a trench in a semiconductor substrate, the collar having a lower edge self-aligned to a top edge of a buried plate disposed adjacent to a lower portion of the trench.

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