Electric lamp and discharge devices – Discharge devices having a thermionic or emissive cathode
Patent
1994-06-29
1996-09-03
O'Shea, Sandra L.
Electric lamp and discharge devices
Discharge devices having a thermionic or emissive cathode
313309, 313336, 313351, H01J 102
Patent
active
055526594
ABSTRACT:
An electron emitter contains a gate layer (38), an underlying dielectric layer (36), an intermediate non-insulating layer (34) situated below the dielectric layer, and a lower non-insulating region (32) situated below the intermediate non-insulating layer. A multiplicity of electron-emissive particles (42) are situated over the non-insulating region at the bottom of an opening (40) extending through the three layers. The ratio of the thickness of the dielectric layer to the thickness of the intermediate non-insulating layer is in the range of 1:1 to 4:1, while the ratio of the mean diameter of the opening to the thickness of the intermediate non-insulating layer is in the range 1:1 to 10:1. The presence of the intermediate non-insulating layer improves the collimation of the beam of electrons emitted from the electron-emissive elements. The electron emitter is manufactured according to a simple, readily controllable process.
REFERENCES:
patent: 4008412 (1977-02-01), Yuito et al.
patent: 4338164 (1982-07-01), Spohr
patent: 4345181 (1982-08-01), Shelton
patent: 5019003 (1991-05-01), Chason
patent: 5070282 (1991-12-01), Epsztein
patent: 5129850 (1992-07-01), Kane et al.
patent: 5141460 (1992-08-01), Jaskie et al.
patent: 5150019 (1992-09-01), Thomas et al.
patent: 5151061 (1992-09-01), Sandhu
patent: 5199918 (1993-04-01), Kumar
patent: 5229331 (1993-07-01), Doan et al.
patent: 5252833 (1993-10-01), Kane et al.
patent: 5278475 (1994-01-01), Jaskie et al.
Busta, "Vacuum microelectronics--" 1992, J. Micromech. Microeng., 1992, pp. 43-74.
Fischer, "Production and use of nuclear tracks; imprinting structure on solids," Reviews of Modern Phys., Oct. 1993, pp. 907-948.
Corcoran Patrick A.
Macaulay John M.
Spindt Christopher J.
Veneklasen Lee H.
MacPherson Alan H.
Meetin Ronald J.
O'Shea Sandra L.
Patel Vip
Silicon Video Corporation
LandOfFree
Structure and fabrication of gated electron-emitting device havi does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Structure and fabrication of gated electron-emitting device havi, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Structure and fabrication of gated electron-emitting device havi will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1952432