Structural defect detection

Radiant energy – Radiation tracer methods

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G01N 130

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active

044369999

ABSTRACT:
A method and composition for the detection of microdefects in the surface layer of a substrate is disclosed. The composition utilizes dimethylsulfoxide as a primary solvent and a fluorescent organic compound which fluoresces principally in solution. The visibility of microdefects is enhanced by etching the substrate underlying them to form channels for the fluorescent compound.

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patent: 3652224 (1972-03-01), Johnson et al.
patent: 4039838 (1977-08-01), DiPiazza
patent: 4125440 (1978-11-01), Markovits
patent: 4172224 (1979-10-01), Lapinski et al.
patent: 4237379 (1980-12-01), Deckert et al.
patent: 4278508 (1981-07-01), White et al.
W. Kern et al., "Fluorescence Techniques Allow Defect Study in Microelectronics", Industrial Research & Development, May, 1982.

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