Compositions – Compositions containing a single chemical reactant or plural... – Organic reactant
Patent
1992-05-28
1993-08-03
Morris, Theodore
Compositions
Compositions containing a single chemical reactant or plural...
Organic reactant
252136, 134 2, 134 3, 134 41, C11D 708, C23G 102, C23G 114
Patent
active
052326195
ABSTRACT:
An aqueous stripping solution and method for selectively removing a titanium compound from a base metal. The aqueous solution contains a source of hydrogen peroxide, an alkali source of hydroxyl ions and an acid with the components in a concentration such that the pH of the solution is above 8.
REFERENCES:
patent: 2649361 (1953-08-01), Springer et al.
patent: 3300349 (1967-01-01), Tershin et al.
patent: 3356500 (1964-09-01), Autrey
patent: 3649194 (1972-03-01), Glanville
patent: 3903244 (1975-09-01), Winkley
patent: 4000083 (1976-12-01), Heesen
patent: 4022703 (1977-05-01), Bakes et al.
patent: 4410396 (1983-10-01), Somers et al.
patent: 4459216 (1984-07-01), Nakazato et al.
patent: 4545918 (1985-10-01), Pralus
patent: 4554049 (1985-11-01), Bastenbeck
patent: 4600443 (1986-07-01), Basalyk et al.
patent: 4608091 (1986-08-01), Sullivan
patent: 4619707 (1986-10-01), Hirschmeier et al.
patent: 4707191 (1987-11-01), Martinou et al.
patent: 4746369 (1988-05-01), Sullivan et al.
patent: 4770808 (1988-09-01), McDonogh et al.
patent: 4950359 (1990-08-01), Parissis et al.
patent: 4970094 (1990-11-01), Byrd
Advertising brochure describing "ENSTRIP".
El-Arini Zeinab
Lieberstein Eugene
Morris Theodore
Praxair S.T. Technology, Inc.
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