Stripping method

Radiation imagery chemistry: process – composition – or product th – Stripping process or element

Reexamination Certificate

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Details

C430S257000, C430S258000, C430S259000, C430S260000, C430S263000, C430S331000

Reexamination Certificate

active

06878500

ABSTRACT:
Compositions and methods for the removal of patterned photodefinable materials, such as photoresists and/or photoimageable dielectric materials, from substrates are provided. Such compositions and methods are useful in the manufacture of electronic devices. Methods of reworking electronic device substrates by removing patterned photodefinable material from an underlying organic film are also provided.

REFERENCES:
patent: 5866305 (1999-02-01), Chon et al.
patent: 6183942 (2001-02-01), Kim et al.
patent: 6306564 (2001-10-01), Mullee
patent: 6432622 (2002-08-01), Moon et al.
patent: 6451223 (2002-09-01), Jeon
patent: 6475292 (2002-11-01), Sahbari
patent: 6589719 (2003-07-01), Ahn et al.

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