Stripping liquid compositions

Details Stripping liquid compositions Stripping liquid compositions

1995-04-28

1996-01-02

Hollrah, Glennon H.

Compositions

Fluent dielectric

N-containing

252545, 252548, 134 38, 430329, C11D 140, C11D 170, C11D 1755, G03C 530

Patent

active

054805856

ABSTRACT:
A photoresist stripping liquid composition comprising an alkanol amine compound, a sulfone compound or sulfoxide compound, and a hydroxy compound. The composition is excellent in its photoresist stripping performance, safety and working efficiency, and does not cause corrosion on a substrate possessing a metal film.

REFERENCES:
patent: 4168989 (1979-09-01), Edelman et al.
patent: 4765844 (1988-08-01), Merrem et al.
patent: 4786578 (1988-11-01), Neisius et al.
patent: 4844832 (1989-07-01), Kobayashi et al.
patent: 5124233 (1992-06-01), Meier et al.
patent: 5268260 (1993-12-01), Bantu et al.

Affiliated with

Also associated with

Rating

Stripping liquid compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stripping liquid compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stripping liquid compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-233181