Stripping compositions comprising hydroxylamine and alkanolamine

Details Stripping compositions comprising hydroxylamine and alkanolamine Stripping compositions comprising hydroxylamine and alkanolamine

1990-11-05

1994-01-18

Lieberman, Paul

Compositions

Fluent dielectric

N-containing

252156, 252158, 252DIG8, 134 38, 204146, C11D 330, C11D 732, C11D 726, C11D 750

Patent

active

052797716

ABSTRACT:
A stripping composition for removing resists from substrates containing hydroxylamine and at least one alkanolamine is described. Optionally, one or more polar solvents can also be included in the stripping composition. The stripping composition is especially suitable for removing a photoresist from a substrate during the manufacture of semiconductor integrated circuits and for removing cured polymer coatings, such as polyimide coatings.

REFERENCES:
patent: 3615825 (1971-10-01), Gansser
patent: 3619390 (1971-11-01), Dillenberg
patent: 3640810 (1972-02-01), Plasynski et al.
patent: 3914185 (1975-10-01), Inamorato
patent: 3972839 (1976-08-01), Murphy
patent: 4111767 (1978-09-01), Kawagishi et al.
patent: 4268406 (1981-05-01), O'Brien et al.
patent: 4509989 (1985-04-01), Sumansky
patent: 4786578 (1988-11-01), Neisius et al.
patent: 4929301 (1990-05-01), Beechko
patent: 4941941 (1990-07-01), Austin et al.

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