Stripping compositions and methods of stripping resists

Details Stripping compositions and methods of stripping resists Stripping compositions and methods of stripping resists

1982-08-17

1983-07-26

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430260, 430309, 430329, 430331, 134 38, 252171, 252364, 252542, B01F 100, B08B 700, G03C 500

Patent

active

043954790

ABSTRACT:
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a tetrahydrothiophene 1,1-dioxide compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions.

REFERENCES:
patent: 3649287 (1972-03-01), DePauw et al.
patent: 3673099 (1972-06-01), Corby et al.
patent: 3932317 (1976-01-01), Williams
patent: 4276186 (1981-06-01), Bakos
patent: 4304681 (1981-12-01), Martin
IBM Technical Disclosure Bulletin, vol. 16, No. 1, 1973, p. 47.

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