Stripping compositions and methods of stripping resists

Details Stripping compositions and methods of stripping resists Stripping compositions and methods of stripping resists

1982-09-02

1983-09-06

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

134 38, 252153, 252171, 252542, 252544, 252549, 252364, 252DIG4, 430260, 430309, 430329, 430331, G03C 530, B08B 700, C11D 118, B01F 100

Patent

active

044030290

ABSTRACT:
Stripping compositions for removing resist materials from substrates comprise compositions of dimethylacetamide or dimethylformamide or a mixture thereof and a tetrahydrothiophene 1,1-dioxide compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions

REFERENCES:
patent: 2891849 (1959-06-01), Whitbourne
patent: 4304681 (1981-12-01), Martin et al.

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