Stripping compositions and methods of stripping resists

Details Stripping compositions and methods of stripping resists Stripping compositions and methods of stripping resists

1982-09-07

1983-08-30

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430260, 430309, 430329, 430331, 134 38, 252153, 252171, 252364, 252542, B08B 700, C11D 118, B01F 100, G03C 500

Patent

active

044017480

ABSTRACT:
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and tetrahydrofuran compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions.

REFERENCES:
patent: 3607271 (1971-09-01), Hilhorst et al.
patent: 3673099 (1972-06-01), Corby et al.
patent: 4055515 (1977-10-01), Kirch
patent: 4276186 (1981-06-01), Bakos et al.

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