Stripping compositions and methods of stripping resists

Details Stripping compositions and methods of stripping resists Stripping compositions and methods of stripping resists

1982-09-02

1983-08-30

Downey, Mary F.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

Forming nonplanar image

430260, 430309, 430329, 430331, 134 38, 252153, 252171, 252364, 252542, 252549, 252DIG4, G03C 500, B08B 700, B01F 100, C09D 900

Patent

active

044017472

ABSTRACT:
Stripping compositions for removing resist materials from substrates comprise compositions of a 2-pyrrolidinone compound and a dialkyl sulfone compound. Either or both of polyethylene glycol and a diethylene glycol monoalkyl ether may be added to provide even more effective stripping compositions.

REFERENCES:
patent: 2891849 (1959-06-01), Whitbourne
patent: 3607271 (1971-09-01), Hilhorst et al.
patent: 3673099 (1972-06-01), Corby et al.
patent: 4055515 (1977-10-01), Kirch
patent: 4276186 (1981-06-01), Bakos et al.
patent: 4304681 (1981-12-01), Martin et al.

Affiliated with

Also associated with

Rating

Stripping compositions and methods of stripping resists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stripping compositions and methods of stripping resists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stripping compositions and methods of stripping resists will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-906345