Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2011-07-12
2011-07-12
Landau, Matthew C (Department: 2813)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S149000, C438S745000, C257SE21309, C257SE21414
Reexamination Certificate
active
07977250
ABSTRACT:
A method for manufacturing a liquid crystal display includes simultaneously forming a gate electrode and a gate bus line on a transparent dielectric substrate, simultaneously forming a channel layer, an ohmic contact layer, and source/drain electrodes by forming a gate insulation film, an amorphous silicon film, a doped amorphous silicon film, and a metal film on the transparent dielectric substrate on which the gate electrode and the gate bus line are formed and etching the metal film, the amorphous silicon film, and the doped amorphous silicon film, and forming a pixel electrode by forming a protective film and a transparent metal film on the transparent dielectric substrate upon which the source/drain electrodes are formed and finely etching the transparent metal film through a lift-off process using a stripper solution.
REFERENCES:
patent: 4992108 (1991-02-01), Ward et al.
patent: 5605845 (1997-02-01), Young
patent: 6080606 (2000-06-01), Gleskova et al.
patent: 6211127 (2001-04-01), Kim et al.
patent: 6541790 (2003-04-01), Pichler
patent: 6558879 (2003-05-01), Peters et al.
patent: 6894311 (2005-05-01), Maeda et al.
patent: 6972516 (2005-12-01), Stecki et al.
patent: 7118947 (2006-10-01), Yoo et al.
patent: 7488632 (2009-02-01), Ahn et al.
patent: 2001/0014534 (2001-08-01), Aoki et al.
patent: 2002/0135722 (2002-09-01), Lee
patent: 2002/0140877 (2002-10-01), Chen
patent: 2004/0195571 (2004-10-01), Ahn et al.
patent: 2004/0197966 (2004-10-01), Cho et al.
patent: 2004/0198621 (2004-10-01), Lee et al.
patent: 2004/0241931 (2004-12-01), Akimoto et al.
patent: 2005/0077523 (2005-04-01), Ahn et al.
patent: 2005/0078254 (2005-04-01), Lim et al.
patent: 2005/0092995 (2005-05-01), Yoo et al.
patent: 2006/0046361 (2006-03-01), Song et al.
patent: 2006/0046365 (2006-03-01), Park et al.
patent: 2006/0099731 (2006-05-01), Buckley et al.
patent: 2006/0138078 (2006-06-01), Koizumi
patent: 2006/0180815 (2006-08-01), Sarma et al.
Cho Heung Lyul
Kwon Oh Nam
Yoo Soon Sung
Crawford Latanya
Landau Matthew C
LG Display Co. Ltd.
Morgan & Lewis & Bockius, LLP
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