Stripper for radiosensitive resist

Details Stripper for radiosensitive resist Stripper for radiosensitive resist

1983-02-14

1985-05-21

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

430260, 430281, 430329, 134 38, 252153, 252158, 252549, 252DIG4, 252DIG8, G03C 1112, C11D 118, B08B 700

Patent

active

045186758

ABSTRACT:
As a stripper for a radiosensitive resist formed of a poly(fluoroalkyl .alpha.-haloacrylate) or a copolymer thereof, there is used a solution which contains 0.1 to 40 wt. % of an alkali metal alkoxide, an alkali metal hydroxide or a tetraalkylammonium hydroxide in a substantially non-aqueous polar solvent of dimethyl sulfoxide.

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patent: 4304681 (1981-12-01), Martin et al.
patent: 4426250 (1984-01-01), Brailsford
Tada, J. Electrochem. Soc.: Accelerated Brief Communication, Nov. 1979, pp. 1829-1830.
Fieser et al., Organic Experiments, 3rd Ed., D. C. Heath and Co., Lexington, Mass., 1975, pp. 168, 339, 345.

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