Stress measurement method using X-ray diffraction

Details Stress measurement method using X-ray diffraction Stress measurement method using X-ray diffraction

2006-02-21

2006-02-21

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

C378S073000, C073S800000

Reexamination Certificate

active

07003074

ABSTRACT:
A stress of a c-axis-oriented specimen of a tetragonal polycrystal is measured using X-ray diffraction under the assumption of a plane stress state. An X-ray optical system is set in the location of φ=0°, 45° or 90°. An X-ray diffracted at a crystal plane (the direction of the normal thereto is the direction of an angle of ψ) with the Miller indices (hkl) is detected. A diffraction angle θ in a strain state is measured in the vicinity of a Bragg's angle θ0in a non-strain state. Strains ε with respect to a plurality of ψ are calculated from the difference between the measurement values θ and the Bragg's angle θ0. Specific stress calculation formulae are determined with respect to the tetragonal system having the Laue symmetry 4/mmm. The stress is calculated from the slope of the linear line of plotted measurement results.

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