Stress-free mount for imaging mask

Photocopying – Projection printing and copying cameras – Detailed holder for original

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 75, 378 34, 378205, 378208, G03B 2753, G03B 2762

Patent

active

056754035

ABSTRACT:
An imaging mount and apparatus that reduces or eliminates stress induced in an imaging mask mounted thereto. The mount comprises a support block and a trio of mounting pads connected thereto. At least two of the mounting pads are connected to the support block so that their respective positions are adjustable within a predetermined plane which is preferably substantially parallel to a surface of a substrate to be imaged. Each of the mounting pads including means for securing the imaging mask generally parallel to the predetermined plane. The positions the adjustable mounting pads adjust within the predetermined plane responsive to securing of the lithography mask thereto so that the imaging mask is essentially undeflected due to the securing thereof. The absence of deformation (and, as a result, stress) in the imaging mask due to its being secured to the mount reduces the degree of distortion of radiation passing through the mask and to the imprinted surface.

REFERENCES:
patent: 3158381 (1964-11-01), Yammamura
patent: 3943778 (1976-03-01), Wyse
patent: 4006909 (1977-02-01), Ollendorf et al.
patent: 4088312 (1978-05-01), Frosch et al.
patent: 4357006 (1982-11-01), Hayes
patent: 4497465 (1985-02-01), Yeakley et al.
patent: 4506184 (1985-03-01), Siddall
patent: 4747608 (1988-05-01), Sato et al.
patent: 4893403 (1990-01-01), Helflinger et al.
patent: 5374829 (1994-12-01), Sakamoto et al.
patent: 5544213 (1996-08-01), Chiba et al.
Wallace et al. A novel aligner for X-ray Lighography, Nuclear Instruments and Methods in Physics Research, A319, pp. 371-375, 1992.
Paros et al., How to design FLEXURE HINGES, Machine Design, pp. 151-156, Nov. 25, 1965.
Scire et al., Piezodriven 50.mu.m range stage with subnanometer resolution, Rev. Sci. Instrum. 49(12), pp. 1735-1740, Dec. 1976.
Wallace et al. A novel aligner for X-ray lithography, Nuclear Instruments and Methods in Physics Research, A319, pp. 371-375, 1992.
Drawing entitled "IBM Mask".
Drawing entitled "Example of Sperry Mask Mount One of Three Vacuum Holding Cups", Dec. 5, 1996.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Stress-free mount for imaging mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Stress-free mount for imaging mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stress-free mount for imaging mask will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2361443

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.