Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1983-11-21
1985-12-24
Tung, T.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204 1T, 204279, 204400, 20412965, G01N 2746
Patent
active
045604649
ABSTRACT:
A mask for precisely defining the area of a thin metal layer on a substrate to be deplated during measurement of the thickness of the thin metal layer utilizing a coulometric technique. The mask having an adhesive on one side for securing the mask to the thin metal layer and for preventing the leakage of electrolyte between the mask and the thin metal layer.
REFERENCES:
patent: 2319196 (1943-05-01), Anderson et al.
patent: 2457234 (1948-12-01), Herbert et al.
patent: 3012958 (1961-12-01), Vixler
patent: 3139394 (1964-06-01), Oelgoetz
patent: 3410772 (1968-11-01), Geld et al.
patent: 3467592 (1969-09-01), Eisberg et al.
patent: 4274418 (1981-06-01), Vesterager et al.
patent: 4310389 (1982-01-01), Harbulak
LandOfFree
Stick-on-mask for use with coulometric measuring instruments does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stick-on-mask for use with coulometric measuring instruments, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stick-on-mask for use with coulometric measuring instruments will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1477813