Sterilization by low energy electron beam

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2504921, 250435, H01J 3700, H01J 3730, H01J 37301

Patent

active

061406570

ABSTRACT:
A sterilization apparatus wherein one or more electron beam tubes are used to direct electron beams into an ambient gaseous environment to create an electron plasma cloud into which non-sterile target objects may be moved. The electron plasma cloud is formed by interaction of the electron beam with the ambient atmosphere. Helium or other like gaseous may be used to expand the effective volume of the electron plasma cloud. Manipulators are used to move target objects in the electron plasma cloud, exposing non-sterile surfaces to the cloud and then joining the surfaces together where appropriate. The beam tube used to generate the electron beam has a thin low energy absorbing window which allows relatively low energy beams to be used, minimizing damage to materials within the surface of the target objects.

REFERENCES:
patent: 3780308 (1973-12-01), Nablo
patent: 3948601 (1976-04-01), Fraser et al.
patent: 4652763 (1987-03-01), Nablo
patent: 4801427 (1989-01-01), Jacob
patent: 5120972 (1992-06-01), Rangwalla et al.
patent: 5200158 (1993-04-01), Jacob
patent: 5530255 (1996-06-01), Lyons et al.
patent: 5612588 (1997-03-01), Wakalopulos
patent: 5962995 (1999-10-01), Avnery

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Sterilization by low energy electron beam does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Sterilization by low energy electron beam, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Sterilization by low energy electron beam will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2054766

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.