Plastic article or earthenware shaping or treating: apparatus – Means applying electrical or wave energy directly to work – Radiated energy
Patent
1997-03-03
1999-07-13
Davis, Robert
Plastic article or earthenware shaping or treating: apparatus
Means applying electrical or wave energy directly to work
Radiated energy
264401, B29C 3508, B29C 4102
Patent
active
059223642
ABSTRACT:
An apparatus and method for depositing a layer of liquid medium along an upper surface of a liquid medium bath. A first reserve supply volume projecting upwardly from said surface and a continuous sheet of discharged liquid medium are provided above a working zone along said surface. The discharged liquid medium sheet is substantially uniformly deposited to produce a continuous supply of liquid medium and to add liquid medium to the first reserve supply volume as the continuous sheet moves along the upper bath surface. A liquid medium layer having a preselected thickness is formed with liquid medium flowing from said first reserve supply volume of liquid medium. An applicator assembly includes an applicator device and a pumping assembly to produce the reserve supply volume from a liquid medium bath.
REFERENCES:
patent: 5248249 (1993-09-01), Yamamoto et al.
patent: 5263130 (1993-11-01), Pomerantz et al.
patent: 5474719 (1995-12-01), Fan et al.
patent: 5626919 (1997-05-01), Chapman et al.
patent: 5647931 (1997-07-01), Retallick et al.
patent: 5665401 (1997-09-01), Serbin et al.
patent: 5667820 (1997-09-01), Heller et al.
Davis Robert
Markva Neil F.
LandOfFree
Stereolithography layering control system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Stereolithography layering control system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Stereolithography layering control system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2273750