Stepper alignment method and apparatus

Details Stepper alignment method and apparatus Stepper alignment method and apparatus

1999-01-25

2000-10-31

Krizek, Janice L.

Material or article handling

Article reorienting device

Orienter has article gripping means

414816, 414936, B65G 4724

Patent

active

061392510

ABSTRACT:
A stepper alignment method and apparatus for transferring circuit layout on a mask to a wafer precisely includes a stepper located in a susceptor and includes a vacuum chuck and a movable vacuum chuck. The wafer has two notches on its perimeter. The vacuum chuck has two sets of photo sensors mating against the notches and a central circular opening for housing the movable vacuum chuck therein. The movable vacuum chuck holds the wafer by means of vacuum force and is able to rotate and move linearly to align the notches of the wafer against the photo sensors accurately at high speed.

REFERENCES:
patent: 5238354 (1993-08-01), Volovich
patent: 5513948 (1996-05-01), Bacchi et al.
patent: 5692873 (1997-12-01), Weeks et al.
patent: 5842825 (1998-12-01), Brooks

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