Step mask for substrate sputtering

Details Step mask for substrate sputtering Step mask for substrate sputtering

1980-11-17

1982-03-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

118504, 118505, 204298, C23C 1500

Patent

active

043222773

ABSTRACT:
A mask for protecting the edges of substrates being sputtered from the sputtering material includes grooves which loosely receive the substrates. The width of the grooves exceeds the width of the substrates by a first dimension and the depth of the grooves above the substrate exceeds the thickness of the substrates by a second dimension. The ratio of the first to the second dimension is at least 5.

REFERENCES:
patent: 3514391 (1970-05-01), Hablanian et al.
patent: 3766041 (1973-10-01), Wasa et al.
patent: 3860507 (1975-01-01), Vossen, Jr.
patent: 3897325 (1975-07-01), Aoshima et al.
patent: 3999283 (1976-12-01), Dean et al.
patent: 4010312 (1977-03-01), Pinch et al.
patent: 4071426 (1978-01-01), Pinch et al.

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