Photocopying – Projection printing and copying cameras – Detailed holder for photosensitive paper
Reexamination Certificate
2005-05-31
2005-05-31
Kim, Peter B. (Department: 2851)
Photocopying
Projection printing and copying cameras
Detailed holder for photosensitive paper
C355S078000, C355S087000
Reexamination Certificate
active
06900881
ABSTRACT:
Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
REFERENCES:
patent: 3783520 (1974-01-01), King
patent: 4070116 (1978-01-01), Frosch et al.
patent: 4119688 (1978-10-01), Hiraoka
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4426247 (1984-01-01), Tamamura et al.
patent: 4451507 (1984-05-01), Beltz et al.
patent: 4507331 (1985-03-01), Hiraoka
patent: 4552833 (1985-11-01), Ito et al.
patent: 4600309 (1986-07-01), Fay
patent: 4610442 (1986-09-01), Oku et al.
patent: 4657845 (1987-04-01), Frechet et al.
patent: 4692205 (1987-09-01), Sachdev et al.
patent: 4707218 (1987-11-01), Giammarco et al.
patent: 4737425 (1988-04-01), Lin et al.
patent: 4763886 (1988-08-01), Takei
patent: 4808511 (1989-02-01), Holmes
patent: 4826943 (1989-05-01), Ito et al.
patent: 4848911 (1989-07-01), Uchida et al.
patent: 4857477 (1989-08-01), Kanamori
patent: 4891303 (1990-01-01), Garza et al.
patent: 4908298 (1990-03-01), Hefferon et al.
patent: 4919748 (1990-04-01), Bredbenner et al.
patent: 4921778 (1990-05-01), Thackeray et al.
patent: 4931351 (1990-06-01), McColgin et al.
patent: 4964945 (1990-10-01), Calhoun
patent: 4976818 (1990-12-01), Hashimoto et al.
patent: 4980316 (1990-12-01), Huebner
patent: 4999280 (1991-03-01), Hiraoka
patent: 5053318 (1991-10-01), Gulla et al.
patent: 5071694 (1991-12-01), Uekita et al.
patent: 5074667 (1991-12-01), Miyatake
patent: 5108875 (1992-04-01), Thackeray et al.
patent: 5148036 (1992-09-01), Matsugu et al.
patent: 5148037 (1992-09-01), Suda et al.
patent: 5151754 (1992-09-01), Ishibashi et al.
patent: 5169494 (1992-12-01), Hashimoto et al.
patent: 5173393 (1992-12-01), Sezi et al.
patent: 5179863 (1993-01-01), Uchida et al.
patent: 5198326 (1993-03-01), Hashimoto et al.
patent: 5212147 (1993-05-01), Sheats
patent: 5234793 (1993-08-01), Sebald et al.
patent: 5240878 (1993-08-01), Fitzsimmons et al.
patent: 5242711 (1993-09-01), DeNatale et al.
patent: 5244818 (1993-09-01), Jokerst et al.
patent: 5314772 (1994-05-01), Kozicki et al.
patent: 5318870 (1994-06-01), Hartney
patent: 5324683 (1994-06-01), Fitch et al.
patent: 5328810 (1994-07-01), Lowrey et al.
patent: 5330881 (1994-07-01), Sidman et al.
patent: 5362606 (1994-11-01), Hartney et al.
patent: 5366851 (1994-11-01), Novembre
patent: 5374454 (1994-12-01), Bickford et al.
patent: 5376810 (1994-12-01), Hoenk et al.
patent: 5380474 (1995-01-01), Rye et al.
patent: 5417802 (1995-05-01), Obeng
patent: 5421981 (1995-06-01), Leader et al.
patent: 5422295 (1995-06-01), Choi et al.
patent: 5424549 (1995-06-01), Feldman
patent: 5431777 (1995-07-01), Austin et al.
patent: 5439766 (1995-08-01), Day et al.
patent: 5453157 (1995-09-01), Jeng
patent: 5458520 (1995-10-01), DeMercurio et al.
patent: 5468542 (1995-11-01), Crouch
patent: 5527662 (1996-06-01), Hashimoto et al.
patent: 5654238 (1997-08-01), Cronin et al.
patent: 5670415 (1997-09-01), Rust
patent: 5700626 (1997-12-01), Lee et al.
patent: 5736424 (1998-04-01), Prybyla et al.
patent: 5743998 (1998-04-01), Park
patent: 5747102 (1998-05-01), Smith et al.
patent: 5760500 (1998-06-01), Kondo et al.
patent: 5855686 (1999-01-01), Rust
patent: 5895263 (1999-04-01), Carter et al.
patent: 5907782 (1999-05-01), Wu
patent: 5912049 (1999-06-01), Shirley
patent: 5926690 (1999-07-01), Toprac et al.
patent: 5948219 (1999-09-01), Rohner
patent: 5948570 (1999-09-01), Kornblit et al.
patent: 6033977 (2000-03-01), Gutsche et al.
patent: 6035805 (2000-03-01), Rust
patent: 6096655 (2000-08-01), Lee et al.
patent: 6150231 (2000-11-01), Muller et al.
patent: 6150680 (2000-11-01), Eastman et al.
patent: 6245581 (2001-06-01), Bonser et al.
patent: 6274294 (2001-08-01), Hines
patent: 6326627 (2001-12-01), Putvinski et al.
patent: 6329256 (2001-12-01), Ibok
patent: 6334960 (2002-01-01), Willson et al.
patent: 6383928 (2002-05-01), Eissa
patent: 6387783 (2002-05-01), Furukawa et al.
patent: 6388253 (2002-05-01), Su
patent: 6391798 (2002-05-01), DeFelice et al.
patent: 6455411 (2002-09-01), Jiang et al.
patent: 6482742 (2002-11-01), Chou
patent: 6489068 (2002-12-01), Kye
patent: 6514672 (2003-02-01), Tsai et al.
patent: 6534418 (2003-03-01), Plat et al.
patent: 6541360 (2003-04-01), Lyons et al.
patent: 6561706 (2003-05-01), Singh et al.
patent: 6565928 (2003-05-01), Sakamoto et al.
patent: 6632742 (2003-10-01), Yang et al.
patent: 6635581 (2003-10-01), Wong
patent: 6646662 (2003-11-01), Nebashi et al.
patent: 6677252 (2004-01-01), Marsh
patent: 6703190 (2004-03-01), Elian et al.
patent: 6716767 (2004-04-01), Shih et al.
patent: 6730256 (2004-05-01), Bloomstein et al.
patent: 6737202 (2004-05-01), Gehoski et al.
patent: 6743713 (2004-06-01), Mukherjee-Roy et al.
patent: 6676983 (2004-07-01), Malfait
patent: 6770852 (2004-08-01), Steger
patent: 6776094 (2004-08-01), Whitesides et al.
patent: 6777170 (2004-08-01), Bloomstein et al.
patent: 2002/0132482 (2002-09-01), Chou
patent: 2002/0167117 (2002-11-01), Chou
patent: 2003/0080471 (2003-05-01), Chou
patent: 2003/0081193 (2003-05-01), White et al.
patent: 2003/0113638 (2003-06-01), Mancini et al.
patent: 2003/0129542 (2003-07-01), Shih et al.
patent: 2004/0029041 (2004-02-01), Shih et al.
patent: 2004/0036201 (2004-02-01), Chou et al.
patent: 55-88332 (1978-12-01), None
patent: 57-7931 (1982-01-01), None
patent: 63-138730 (1986-12-01), None
patent: 02-24848 (1990-01-01), None
patent: 02-92603 (1990-04-01), None
patent: WO 00/21689 (2000-04-01), None
patent: WO 01/47003 (2001-06-01), None
Chou et al., “Imprint of Sub-25 nm vias and Trenches in Polymers”, Applied Physics Letters, Nov. 20, 1995, pp. 3114-3116, vol. 67(21).
Chou et al., “Imprint Lithography with 25-Nanometer Resolution”, Science, Apr. 5, 1996, pp. 85-87, vol. 272.
Chou et al., “Imprint Lithography with Sub-10nm Feature Size and High Throughput”, Microelectronic Engineering, 1997, pp. 237-240, vol. 35.
Kim et al., “High Precision Magnetic Levitation Stage for Photolithography”, Precision Engineering, 1998, pp. 66-77, vol. 22, Elsevier Science Inc., 655 Avenue of the Americas, NY, NY 10010.
Choi et al., “High Precision Orientation Alignment and Gap Control Stages for Imprint Lithography Processes,” U.S. Appl. No. 09/698,317, Filed Oct. 27, 2000.
Sreenivasan et al., “High-Resolution Overlay Alignment Methods and Systems for Imprint Lithography,” U.S. Appl. No. 09/907,512, Filed Jul. 16, 2001.
Choi et al., “Method and System of Automatic Fluid Dispensing for Imprint Lithography Processes,” U.S. Appl. No. 09/908,455, Filed Jul. 17, 2001.
Choi et al., “Methods for High-Precision Gap and Orientation Sensing Between a Transparent Template and Substrate for Imprint Lithography,” U.S. Appl. No. 09/920,341, Filed Aug. 1, 2001.
Choi et al., “Flexture Based Macro Motion Translation Stage,” U.S. Appl. No. 09/934,248, Filed Auguts 21, 2001.
Bailey et al., “Template for Room Temperature Low Pressure Micro-and Nano-Imprint Lithography,”, U.S. Appl. No. 09/976,681, Filed Oct. 12, 2001.
Voisin, “Methods of Manufacturing a Lithography Template,” U.S. Appl. No. 10/136,188, Filed May 1, 2002.
Willson et al., “Method and System for Fabricating Nanoscale Patterns in Light Curable Compositions Using an Electric Field,” U.S. Appl. No. 09/905,718, Filed May 16, 2002.
Watts et al., “Low Viscosity High Resolution Patterning Material,” U.S. Appl. No. 10/178,947, Filed Jun. 24, 2002.
Watts et al., “System and Method for Dispensing Liquids,” U.S. Appl. No. 10/191,749, Filed Jul. 9, 2002.
Sreenivasan et al., “Step and Repeat Imprint Lithography Processes,” U.S. Appl. No. 10/194,991, Filed Jul. 11, 2002.
Sreenivasan et al., “Method
Choi Byung Jin
Meissl Mario J.
Schumaker Norman E.
Sreenivasan Sidlgata V.
Voisin Ronald D.
Brooks Kenneteh C.
Kim Peter B.
Molecular Imprints, Inc.
LandOfFree
Step and repeat imprint lithography systems does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Step and repeat imprint lithography systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Step and repeat imprint lithography systems will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3405655